Vacuum system for double-sided or one-sided sputtering with ion cleaning and disc substrate holder

ATIS-500 vacuum system is intended for deposition of coatings by method of magnetron sputtering of the target material with preliminary ion-beam cleaning. The system allows to deposit coatings as on one or both sides of the substrates in one vacuum process.

The coatings are deposited on substrates installed on a substrate holder of disk type.

Features:

• Possibility to install up to 8 technological devices (up to 4 devices into top side of the system and up to 4 pcs. into bottom side)

• System of substrates heating for up to 400 оС

Technical data:

Technological devices:

• DC-magnetrons (possibility to install up to 6 pcs.)

• Ion-beam cleaning source (possibility to install up to 2 pcs.)

• RF-magnetron (optionally)