Universal sputtering systems for R&D and small batch production

A wide range of possible configurations of ELATO vacuum systems allows to be maximum flexible in assembling the system for the exact tasks for the customer.

Features*:

• Electron Beam Evaporation (E-beam) system

• Resistive evaporation system

• Magnetron sputtering system

• Ion beam cleaning system

• Substrate holder: single disc, dome

• Substrate heating system up to 400 °C

• High efficiency in sputtering of precious metals

*the configuration of technological devices is determined in accordance with the customer’s requirements

Technological devices:

• Electron-beam evaporation system

• Resistive evaporation system

• Ion-beam source for cleaning and assistance

• RF-magnetrons

• RF ion-beam assistance source

• DC-magnetrons

Technical data:

*Coating uniformity may vary from one technological device to another