Vacuum system for decorative metallization of 3D substrates with high productivity
Features:
Magnetron sputtering system
Ion beam cleaning system
Possibility to install up to 4 technological devices
Two doors with planetary substrate holder on each for higher productivity of the system
Elimination of delays between main painting process, metallization and last protective coating which helps to decrease risks of contaminations.
Possibility to install a system for supplying the chamber with vapors of organosilicon liquids
Examples of use:
The coating is applied by magnetron sputtering with ion beam cleaning. The vacuum unit has a D-shaped chamber with two doors. The doors of the chamber are equipped with drum-type substrate holders with a planetary rotation mechanism. Overloading of samples on one door is performed during sputtering on samples on the second door.
Technological devices:
DC-magnetrons
Ion-beam cleaning source