Ion-beam treatment of the surface defined as a certain effect resulting from applying ion beams (of a certain character with defined energy and ions density) to the target object.

Ions of the operation gas are generated crossed electrical and magnetic fields and their acceleration and energy are resulting from the difference of potentials within anode-cathode. Ions resulting from the working gas ionization together with drifting electrons within closed magnetic field create an anode layer. Devices comprise such physical principals are called anode layer accelerators.

Application:

Anode layer accelerators applied in a variety of vacuum systems (as batch and in-line types) within different technological processes of treating the large-form substrates from 250 mm to 3 m (sometimes more), like: cleaning, polishing and activation of the surface, precise ion-beam etching, films deposition on the substrate, ion-beam assisting while films deposition. Preliminary ion-beam cleaning is the most effective when applying before the coating deposition in one vacuum cycle.

Main tasks:

• cleaning and activation of the surface;

• precise polishing;

• deposition of functional thin films of high density: protective, dielectric, diamond-like, complicated layers compositions from variety of materials;

• precise etching (minimal elements sizes from 0.2 microns with 0.05 microns accuracy; width-to-height step ratio more than 30:1; adjusting of beam angle to the treated surface helps to control step profile and trench configuration)

Linear anode layer accelerators “Luch” are used in Diamanta, Elato, Atis, Ortus, Izolab, Izomet.

Technical data: