System of automatic broadband optical control of the sputtering process
Features:
The main control mode is the measurement of optical transmittance on the substrate (witness) placed directly on the rotating substrate holder (direct measurement). The spectrometer measures the real spectrum of the coating over the entire operating range after each rotation of the substrate holder
Optimization algorithms monitor the current result during the sputtering process and, in case of deviations on previous layers, recalculate the structure and introduce corrections on the next layers to compensate for previous deviations.
Technical data:
